Patterning the World: The Rise of Chemically Amplified Photoresists

Patterning the World

David C. Brock
Studies in Materials Innovation
2009, Chemical Heritage Foundation
21 pp
Soft Cover, 8.5 x 11, Product #1437952771
$15.00

View | Download

The rise of the Digital Age has been predicated on Moore’s law—optimal economic advantage comes from an exponential increase in the performance of electronic components, accompanied by an exponential decrease in price. It is about semiconductor mfg. technol. In the early 1980s researchers in the semiconductor industry realized that the then dominant version of a central material on which semiconductor mfg. technol. was built—photoresist—would soon be insufficient. Therefore, a new form of photoresist would be required. This case study examines the innovation of the first of these “chemically amplified photoresists” by IBM in the 1980s. The case supports four findings with implications for our understanding of the nature of innovation.

About Studies in Materials Innovation

Part of the Robert W. Gore Materials Innovation Project, this white paper series aims to illuminate the diverse contributions of materials innovation within the broader process of technological development in the contemporary age.

Upcoming Events

Meet us in person at one of these events:

Historically Grounded Perspectives

The Center for Contemporary History and Policy explores issues ranging from energy to medicine on CHF's blog, Periodic Tabloid.